Mass Flow Controller MFC2022

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To maximize analytical performance of Inductively Coupled Plasma techniques

Measurement & Instrumentation

Mass Flow Controller MFC2022
Mass Flow Controller MFC2022
Mass Flow Controller MFC2022
Mass Flow Controller MFC2022
Mass Flow Controller MFC2022
Mass Flow Controller MFC2022

Axetris Mass Flow Controllers provide analytical performance to ensure pivotal gas flow control for plasma generation. Inductively Coupled Plasma (ICP) combined with a Mass Spectrometer (ICP-MS) or an Optical Emission Spectroscope (ICP-OES) are extremely popular atomic spectroscopy techniques. Applications are wide-ranging within the environmental, food, pharmaceutical and semiconductor industries. Typically, ICP is an argon plasma reaching temperatures of up to 10'000 K, thereby allowing complete atomization of the analyte into elements for a complete analysis.

Maximizing analytical performance

Gas flow control plays a critical role in maximizing analytical performance of ICP techniques:

  • Plasma and auxiliary flows support plasma generation and control. The quality of plasma is directly related to precision of gas flow control.
  • Nebulizer gas flow should be highly reproducible to achieve high detection limits for the particular analyte.
  • Coolant gas flow should provide enough control resolution across a wide dynamic range to maintain system stability.

Axetris Advantages in ICP applications

  • Extremely high repeatability of typically < 0.15% O.R.
  • Unmatched dynamic range (> 1000:1) to provide flexibility across wide flow range of 0-20 slpm
  • Ultra low flow control for tight control of plasma and analytical process
Posted on June 5, 2018 - (4597 views)
Axetris AG
Schwarzenbergstrasse 10
CH-6056 Kaegiswil - Switzerland
+41- 41 662 76 30
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